Intel announced that it is producing its first 45 nm process prototypes using two new materials
Intel is the first to implement an innovative combination of new materials that drastically reduces transistor leakage and increases performance in its 45nm process technology. The company will use a new material with a property called high-k, for the transistor gate dielectric, and a new combination of metal materials for the transistor gate electrode.
The company believes that it can leverage these new technologies to ensure that Moore’s law extends well into the next decade. Intel claims it’s still on track for 45 nm processors in production by the second half of this year and, bonus: we have a new codename. Penryn is the name for the 45 nm family. *sigh*
The release is actually fairly technical and has a few more details. You might want to check it out if you roll that way.